I believe the 2nm and 5nm capability they are talking is for subsystems of a lithographic machine . AFAIK, ASML is the only company that has EUV light source. But ASML uses subsystems, say for etching, from other companies to build their complete machine. I guess the above products fall into those categories. About 1.5 to 2 years ago, Japanese DUV lithographic machines were at 40nm process node. They are probably at 28 nm or may be 20nm now.
From wiki
https://en.wikipedia.org/wiki/Extreme_u ... ithography
Intel, Canon and Nikon (leaders in the field at the time), as well as ASML and Silicon Valley Group (SVG) all sought licensing, however Congress denied Japanese companies the necessary permission as they were perceived as strong technical competitors at the time, and should not benefit from taxpayer-funded research at the expense of American companies.[9] In 2001 SVG was acquired by ASML, leaving only a single company as the sole benefactor of the critical technology.[10]
By 2018 Dutch company ASML succeeded in deploying the EUV-LLC IP after several decades of developmental research, with incorporation of European-funded EUCLIDES (Extreme UV Concept Lithography Development System) and long-standing partner German optics manufacturer ZEISS and synchrotron light source supplier Oxford Instruments.
Because it is such a key technology for development in many fields, the United States licenser pressured Dutch authorities to not sell these machines to China. ASML has followed the guidelines of Dutch export controls and until further notice, will have no authority to ship the machines to China.[13]
The white countries collectively deny technology to even honorary white countries like Japan. And this is how US keeps a tight leash on the 'me too superpower' white countries by throwing crumbs like allowing one or two world leading companies to emerge in those countries.